TYLAN FC-2911V H2 30SLM DC01333002 MILLIPORE Mass Flow Controller

The TYLAN FC-2911V H2 30SLM DC01333002 MILLIPORE Mass Flow Controller is a high-precision gas flow regulation device designed for accurate hydrogen gas measurement and control in semiconductor, analytical, and industrial gas handling systems.The TYLAN FC-2911V H2 30SLM Mass Flow Controller is engineered to maintain precise flow rates up to 30 standard liters per minute (SLM), making it suitable for applications requiring controlled hydrogen delivery. The FC-2911V DC01333002 model integrates a fast-response control valve and high-stability sensor system, enabling real-time adjustment of gas flow based on process demand.In industrial systems, the MILLIPORE TYLAN FC-2911V is commonly used in thin-film deposition, plasma processing, chemical vapor deposition (CVD), and laboratory gas mixing systems. Its thermal bypass design ensures laminar flow conditions, improving measurement accuracy and long-term stability even under varying pressure and temperature conditions.According to available technical references, the FC-2911V series supports ±2% full-scale accuracy and fast response characteristics suitable for precision gas control applications.

Model: FC-2911V
Product Type: Mass Flow Controller (MFC)
Gas Type: Hydrogen (H₂)
Flow Range: 0–30 SLM (standard liters per minute)
Control Principle: Thermal mass flow measurement with bypass sensor
Accuracy: ±2% full scale (typical)
Linearity: ±0.5% full scale
Repeatability: ±0.2% full scale
Response Time: 3–6 seconds
Operating Pressure: Suitable for low to medium pressure gas systems
Control Valve Type: Electromagnetic proportional valve
Input Signal: Analog control signal (0–5 VDC / optional 4–20 mA)
Power Supply: ±15 VDC typical industrial supply
Power Consumption: Approx. 5–6 W
Electrical Connection: Multi-pin industrial connector
Mounting Type: Inline gas system installation
Operating Temperature: approx. 0°C to 50°C
Housing Material: Industrial-grade metal enclosure
Protection: Designed for stable operation in clean gas environments

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• High-Purity Metallurgical Cavity Isolation: Constructed with an ultra-clean, corrosion-resistant internal flow path, the FC-2911V prevents outgassing and particulate generation, ensuring uncompromised process cleanliness in critical semiconductor deposition and diffusion environments.
  
• Thermodynamic Hydrogen Mass Calibration: The FC-2911V utilizes a high-precision thermal mass sensor to execute direct molecular-count metering of H₂ gas streams, completely eliminating the measurement errors associated with changing process temperatures or fluctuating line pressures.
• Integral Linearizing Laminar Bypass Matrix: Engineered with a specialized internal flow-splitting bypass, the FC-2911V enforces strict laminar flow conditions across the sensor element, preventing Reynolds number transitions and turbulent erraticism from degrading measurement linearity.
• Ultra-Fast Proportional Valve Coherence: The FC-2911V integrates a low-hysteresis electromagnetic proportional control valve driven by a high-speed local microprocessor, delivering sub-second response times during dynamic setpoint transitions and process transients.

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